Work

Maintaining a High Electronic Quality Surface During Patterned Plasma Etching Processes for HJT-IBC Solar Cells

Year: 2025

Type: conference-paper

Source: Conference record of the IEEE Photovoltaic Specialists Conference

DOI: 10.1109/pvsc59419.2025.11132102

Authors: J. Wang, C. Patra, W. Wang, M. Ghosh, P. Bulkin, D. Daineka, K. Dembélé, P. Roca i Cabarrocas, K. Ouaras, S. Filonovich, M. Frégnaux, M. Bouttemy, E. V. Johnson

Institutions: Centre National de la Recherche Scientifique, École Polytechnique, Laboratoire de Physique des Interfaces et des Couches Minces, Institut Polytechnique de Paris, Total (France), Université de Versailles Saint-Quentin-en-Yvelines, Université Paris-Saclay, Institut Lavoisier de Versailles

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

OpenAlex ID: W4413822545

FWCI:

Cites: 7

Cited by:

Related to: 10