Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 °C) Using a Modified Cyclopentadienyl Zr Precursor
Year: 2025
Type: article
Authors: Jae Chan Park, Chang Ik Choi, Hongseok Jang, Suhyong Yun, Miso Kim, Ji-Hoon Ahn, Woo-Hee Kim, Bonggeun Shong, Tae Joo Park
Institutions: Hanyang University, Hongik University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G2056480057, G86085690
OpenAlex ID: W4413880415