Work

On-Wafer Polarity-Specific Response Well-Plasma Charging Recorder in 16 nm CMOS FinFET Technology

Year: 2025

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2025.3600217

Authors: Wei Chang, Shang-Chen Tsai, Burn Jeng Lin, Pin-Jiun Wu, Jiaw-Ren Shih, Yue-Der Chih, Jonathan Chang, Chrong Jung Lin, Ya-Chin King

Institutions: National Tsing Hua University, National Synchrotron Radiation Research Center, Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Science and Technology, Taiwan

OpenAlex ID: W4413887394

FWCI:

Cites: 16

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Related to: 10