Low-temperature hybrid microwave annealing process for high-performance indium–tungsten oxide thin-film transistors
Year: 2025
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0267618
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G5569433665
OpenAlex ID: W4413910367
