Performance Optimization of Short-Channel Top-Gate Ultrathin InSnO Thin-Film Transistor With Gate Dielectric Engineering
Year: 2025
Type: article
Source: IEEE Electron Device Letters
Authors: Linlong Yang, Xi Chen, Lan Ma, Binbin Luo, Ming Yang, Wei Meng, Jiahui Teng, Bao Zhu, Shi-Jin Ding, Xiaohan Wu
Institution: Fudan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G3493594101, G7589130575
OpenAlex ID: W4414008386