Work

Gate stack engineering of two-dimensional transistors

Year: 2025

Type: article

Source: Nature Electronics

DOI: 10.1038/s41928-025-01448-5

Authors: Yeon Ho Kim, Donghun Lee, Woong Huh, Jaeho Lee, Donghyun Lee, Gunuk Wang, Jaehyun Park, Daewon Ha, Chul-Ho Lee

Institutions: Korea University, Kookmin University, Seoul National University, Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

Funder: National Research Foundation of Korea

Award: G2366749134

OpenAlex ID: W4414099394

FWCI: 6.441

Cites: 139

Cited by: 31

Related to: 10