Low-Temperature HfO2 Growth by Atomic Layer Deposition for Hgcdte -Based Infrared Photodetectors
Year: 2025
Type: conference-paper
Authors: Md Fazle Rabbe, M A H Sojib, Md Sakib Ur Rahman, Volodymyr Sheremet, Nibir K. Dhar
Institution: Virginia Commonwealth University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414117579