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Extreme Ultraviolet Light Source: A Feedback Control Primer

Year: 2025

Type: conference-paper

Source: IEEE Conference on Control Technology and Applications (CCTA)

DOI: 10.1109/ccta53793.2025.11151398

Authors: Andrew Liu, Aditya Zadgaonkar, Chao Wang, Erik Farr, Giulia Piovan, Jisang Park, Kasra Esfandiari, Rakesh Joshi, Ricardo Duran-Rodriguez, Yilun Liu, Mauricio de Oliveira

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414117967

FWCI:

Cites: 5

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Related to: 10