Work

Optimization of a SiCl4-Ar inductively coupled plasma etching process for InP-based waveguide devices

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3070866

Authors: Linfan Liu, Tianyu Sun, Yanhui Xing, Zheng Xing, Yulong Xing, Baoshun Zhang

Institutions: Beijing University of Technology, Suzhou Institute of Nano-tech and Nano-bionics

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414196025

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