Numerical analysis approach to thermal stress effects on dislocation behavior due to incomplete seeding in Czochralski (CZ) silicon crystal growth
Year: 2025
Type: article
Authors: Hiroki Tsukada, Rintaro To, Takeshi Hoshikawa, Hiroyuki Saito, Hisashi Matsumura, Toshinori Taishi
Institution: Shinshu University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414206534