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A diffusion model enhanced source optimization for fab productivity

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3063501

Authors: Xiaoxiao Liang, Benjamin C. He, Yuzhe Ma

Institutions: Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology (Guangzhou), University of California, Berkeley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414224233

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