Work

PIC/MCC simulations of the effects of a radio-frequency bias on inductively coupled plasmas

Year: 2025

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/1361-6595/ae0763

Authors: Xiandi Li, Zhaoyu Chen, Zili Chen, Yu Wang, Minglun Tian, Hongyu Wang, Zhipeng Chen, Wei Jiang, Julian Schulze, Ya Zhang

Institutions: Huazhong University of Science and Technology, Anshan Normal University, Ruhr University Bochum, Wuhan University of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Deutsche Forschungsgemeinschaft, National Natural Science Foundation of China

Awards: Elektronenheizung in kapazitiven RF Plasmen basierend auf Momenten der BoltzmannGleichung: Von fundamentalem Verständnis zu wissensbasierter Prozesskontrolle, G6680748996

OpenAlex ID: W4414229709

FWCI: 0.231

Cites: 61

Cited by: 1

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