Work

Electric field induced and natural second order nonlinearity in amorphous dielectric films: from chalcogenide glasses to (ultra) silicon-rich SiNx and SiOx

Year: 2025

Type: conference-paper

Source: Active Photonic Platforms (APP)

DOI: 10.1117/12.3063648

Authors: Laurids Wardenberg, Georg von Freymann, Andre Kuehling, Krishna Koundinya Upadhyayula, Joerg Schilling

Institutions: Martin Luther University Halle-Wittenberg, University of Kaiserslautern, Fraunhofer Institute for Industrial Mathematics, Rheinland-Pfälzische Technische Universität Kaiserslautern-Landau

Language: English

Topic: Nonlinear Optical Materials Research

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414229929

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