UV‐Enhanced, Humidity‐Tolerant Formaldehyde Chemiresistor Based on Ce‐MOF‐Derived CeO 2 Nanospheres Decorated 1D/2D Polyaniline Nanohybrid
Year: 2025
Type: article
Source: Advanced Materials Technologies
Institution: Ming Chi University of Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414247012