Work

Photoassisted Chemical Vapor Deposition Using (η4-Diene)Ru(CO)3 Precursors

Year: 2025

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.5c11415

Authors: Christopher R. Brewer, Bishwaprava Das, Rashmi Singh, Diego Caretti, Dyotana Bhattacharyya, Oluwatamilore Oni, Xin Kang, Jonah Perry, Lisa McElwee-White, Amy V. Walker

Institutions: The University of Texas at Dallas, University of Florida

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Semiconductor Research Corporation, Division of Materials Research

Awards: G4205288980, G4221653093, G5844466785, G7662360816

OpenAlex ID: W4414264928

FWCI: 0.462

Cites: 53

Cited by: 2

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