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Haze formation mechanism and prevention proposal for ArF photomask: a study combining simulation and experiment

Year: 2025

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3077354

Authors: Jiaying Luo, Yi-Jhih Lin, Irene Shi, Sven Bao, Si Huang, Tony Ge, Joe Tian, Yapeng Li, Junli Zhu, Lei Zhu

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274635

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Cites: 1

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