Work

Development of an automated defect repair system utilizing EUV mask property analysis

Year: 2025

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3084224

Authors: Ki-Young Jung, Min-Seok Gu, Sang-Joon Cho, Byoung-Woon Ahn

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274652

FWCI:

Cites: 1

Cited by:

Related to: