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A unified approach for correcting global CDU, long-range, and short-range effects in advanced photomasks

Year: 2025

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3071823

Authors: Alwar Samy Ramasamy, Kushlendra Mishra, Xiaofeng Xiang, Rachit Sharma, Ingo Bork

Institution: Siemens (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274661

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Cites: 7

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