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Electron multibeam mask writer for mature nodes: MBM-2000C

Year: 2025

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3084125

Authors: Issei Aibara, Masashi Uchiya, Takuma Abe, Hiroshi Matsumoto, Yoshinori Kojima, Masato Saito

Institution: Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274676

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Cites: 2

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