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The SLX laser mask writer: advancing performance and expanding application space

Year: 2025

Type: conference-abstract

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3072126

Authors: Robert Eklund, Martin Glimtoft, Fredric Ihrén, Hans Kunkell, Omer Malik, Jakob Holm, Mikael Wahlsten, Youngjin Park, Peter Henriksson

Institution: Mycronic (Sweden)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274725

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