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The effect of the resist formulation on the dissolution behavior of EUV photoresists

Year: 2025

Type: conference-abstract

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.3084401

Authors: Kevin Zhao, Vishal Vinay Singh, Oleg Kostko, Honggu Im, Dahyun Oh

Institutions: San Jose State University, Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414274783

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