Virtual defect metrology system utilizing photolithography scanner topography maps to quantitatively detect gross defects, perform inline yield prediction, and identify defect-generating tools
Year: 2025
Type: article
Authors: Prasenjit Bose, Vishal Kumar Pandey, Michael Staib, Bret Womach, Itamar Balla, Manuel Olmedo, Abhijeet Khandelwal, Ali Ahmadi, Gobind Bisht
Institution: Intel (United States)
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414277105
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