Work

Fabrication of ultra-shallow EUV gratings in silicon via ion irradiation

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3061518

Authors: Johannes Kaufmann, Richard Ciesielski, Katharina Freiberg, Markus Walther, Analía Fernández Herrero, Stephanie Lippmann, Victor Soltwisch, Thomas Siefke, Uwe Zeitner

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414315116

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