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Towards defect-free lithography: study of process instabilities for efficient lithography-based patterning

Year: 2025

Type: conference-abstract

Source: UV and Higher Energy Photonics: From Materials to Applications

DOI: 10.1117/12.3065921

Authors: Sanshrey Keshri, Manjarik Mrinal, Shubham Meena, Tapajyoti D. Gupta

Institution: Indian Institute of Science Bangalore

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414321335

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