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Design method for wafer alignment marks with low alignment position deviation under process-induced asymmetry

Year: 2025

Type: article

Source: Applied Optics

DOI: 10.1364/ao.575552

Authors: Lijun Zhou, Xiangzhao Wang, Zhongliang Li, Peng Feng, Xuan Zhuo, Jinming Gao, Dong Liu, Lan Wu

Institutions: Zhejiang University, Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G3235878875

OpenAlex ID: W4414329843

FWCI: 0.228

Cites: 25

Cited by: 1

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