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Model-based optical proximity correction for talbot lithography considering the non-paraxial Talbot effect

Year: 2025

Type: conference-abstract

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3071554

Authors: Jr-Wei Ke, Jia-Syun Cai, Chien-Lin Lee, Chung-Ping Tang, Kuen-Yu Tsai, Jia-Han Li, Chao-Te Lee

Institutions: National Taiwan University, National Center for Instrumentation Research

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414347309

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