Work

A study of multigon mask data preparation performance and its dependence on multigon data volume

Year: 2025

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3071765

Authors: Amogh Raj, Rachit Sharma, Ranganadh Peesapati, Prince Singh, Stephen Kim

Institution: Siemens (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414362959

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Cites: 3

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