Work

Principles and implications of shadow effect in EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3086272

Authors: Hanyuan Zhang, Yutao Pang, Meihui Qu, Minrui Wan

Institutions: Beihang University, Nanjing University of Information Science and Technology, University of Nottingham Ningbo China

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414367306

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