Atomic layer deposition for hafnium oxide-based meta-optics in the ultraviolet spectral range
Year: 2025
Type: conference-paper
Abstract: Hafnium oxide (HfO 2 ) is a high-index dielectric material of growing importance for optical coatings and meta-optical components operating from the ultraviolet (UV) to the visible spectral range. Its large bandgap, chemical stability, and compatibility with established semiconductor processes make it particularly attractive for applications requiring low absorption and precise thickness control. In this work, we investigate the optical material properties of HfO 2 thin films deposited by plasma-enhanced atomic layer deposition (PEALD). The complex refractive index is experimentally determined over a broad spectral range extending from the vacuum ultraviolet (140 nm) to the visible (600 nm) by combining spectroscopic ellipsometry, spectrophotometry, and infrared ellipsometry. A comprehensive dispersion model is employed to extract consistent optical constants and thickness values. The results highlight the suitability of PEALD-grown HfO 2 films for advanced optical and meta-optical applications.
Source: EPJ Web of Conferences
Authors: Thomas Siefke, Kristin Gerold, Svetlana Shestaeva, Pallabi Paul, Shawon Alam, Daniel Franta, Adriana Szeghalmi, Sven Schröder, Stefanie Kroker
Institutions: Ernst Abbe University of Applied Sciences Jena, Fraunhofer Institute for Applied Optics and Precision Engineering, Friedrich Schiller University Jena, Karlsruhe Institute of Technology, Masaryk University, Physikalisch-Technische Bundesanstalt, Federal Institute For Materials Research and Testing, Technische Universität Braunschweig
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4414393899