Year: 2025
Type: conference-paper
Abstract: Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.
Source: EPJ Web of Conferences
Institution: Delft University of Technology
Language: English
Subfield: Computer Vision and Pattern Recognition
Field: Computer Science
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4414393998