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Recent Advancements in N-polar GaN HEMT Technology

Year: 2025
Type: article
Abstract: N-polar GaN HEMT technology has emerged as a disruptive technology that outperforms Ga-polar GaN HEMTs in terms of high-frequency power amplification capability. In this paper, the authors present a comprehensive review of the evolution of N-polar GaN HEMT technology from the perspective of crystal growth, dielectrics, and metals on N-polar GaN, transistor design, and performance. Specifically, the authors discuss the progress of the N-polar GaN HEMTs toward high-frequency, high-power, and high-efficiency applications with recent record-level performances, demonstrated by the authors, at mmWave frequencies.
Source: Crystals
Language: English
Open Access status: gold
Estimated APC paid: $2,534
OpenAlex ID: W4414406781
FWCI: 3.098
Cites: 172
Cited by: 10
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