Work

New insights into EUV mask modeling based on at-wavelength reflectance measurements

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3062880

Authors: A.J.R. van den Boogaard, Frank Timmermans, Airat Galiullin, Claire van Lare, Steven Beekmans

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414428964

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