Work

The performance evaluation of at-resolution stitching on NXE

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3066067

Authors: Airat Galiullin, Nick Pellens, Vincent Wiaux, Natalia Davydova, Jeremy Chen, Tatiana Kovalevich, Ataklti Weldeslassie

Institutions: ASML (Netherlands), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429002

FWCI: 2.293

Cites:

Cited by: 1

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