Work

Evaluation of HSQ resist Medusa 84 SiH regarding suitability for various process windows

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3066045

Authors: Pia Kohlschreiber, Markus Gottwald, Christian Helke, Harry Biller, Mandy Sendel, Danny Reuter

Institutions: Fraunhofer Institute for Electronic Nano Systems, Chemnitz University of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429005

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