Work

MBMW 401 tool for 2nm and sub-2nm EUV masks

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3065985

Authors: Johannes Leitner, Christoph Spengler, Peter Hudek, Hans Löschner, Elmar Platzgummer

Institution: IMS Nanofabrication (Austria)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429027

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