Work

Analytical waveguide model for EUV masks: insights and comparison with RCWA

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3063145

Authors: Varun Jadhav, Andreas Erdmann

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429037

FWCI:

Cites:

Cited by:

Related to: