Work

Modeling and simulation of mechanical effects in two-photon lithography

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3058688

Authors: Alap Mundayoor, Valeriia Sedova, Joël Rovera, Thomas Le Deun, Andreas Erdmann

Institutions: Fraunhofer Institute for Integrated Systems and Device Technology, IMT Atlantique

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429040

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