Work

R2R-controlled spin speed to achieve the target layer thickness for photoresist- and ARC-materials

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3063066

Authors: Marcel Matthes, Matthias Voigt, André Horn, Lars Albinus

Institution: Infineon Technologies (Germany)

Language: English

Topic: Fault Detection and Control Systems

Subfield: Control and Systems Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429211

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