Work

Challenges and experiences with mask inspection round robin

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3065988

Authors: Jan Heumann, Timo Wandel, Falk Lange, Carina Tan, Sia Kim Tan, Anthony Zhou

Institutions: Advanced Mask Technology Center (Germany), GlobalFoundries (Singapore)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429395

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