Work

Investigation of MURA performance of the multi-beam mask writer 100 Flex, including intra-writing field and beyond

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3065310

Authors: Michael Finken, Johannes Soellner, André Eilert, Nico Noack, Laurent Alexandre, Ralf Ploss

Institution: Advanced Mask Technology Center (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429405

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