Work

Methodology of stitching evaluation at NA 0.33 to enable high-NA assessment

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3066033

Authors: Ataklti Weldeslassie, Airat Galiullin, Nick Pellens, Jyun-Ming Chen, Tatiana Kovalevich, Vincent Wiaux, Natalia Davydova

Institutions: IMEC, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429422

FWCI: 2.277

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Cited by: 1

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