Work

Formation of dissolution-resistant top layer in EUV-CAR resist and possible impact on line edge roughness

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3066035

Authors: Jan Groenewold, Mark van de Kerkhof

Institutions: Utrecht University, Eindhoven University of Technology, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429429

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