Work

Highly parallelized RCWA with optimized eigenvalue problem for efficient simulation of curvilinear mask structures

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3062253

Authors: Peter Evanschitzky, Thao Van Nguyen, Christian Schwemmer, Andreas Erdmann

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Electromagnetic Scattering and Analysis

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429433

FWCI: 7.398

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Cited by: 1

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