Work

A MetroSpection use case: enabling CNN ADC on CDSEM images for robust R&D developments and improved manufacturing quality control

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3062741

Authors: Florent Dettoni, Bertrand Le-Gratiet, Delphine Le Cunff, Nicolas Kubler, Thomas Alcaire, Ewen Mailly

Institution: STMicroelectronics (France)

Language: English

Topic: Industrial Vision Systems and Defect Detection

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429441

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