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More nodes to be covered by multi-beam mask writers: MBM-2000C for mature nodes

Year: 2025
Type: conference-paper
Abstract: MBM-2000C has been released in Q2 2025 for mature nodes. It is equipped with the writing modes to expose the main field with 3-5 hours and adequate writing accuracy. Writing modes can be switched seamlessly without re-calibration of beam to cover a wide range of mature nodes from 45 nm to 7 nm. MBM-2000C has the fidelity control function which allows the fine-tuning of the patterning resolution for pattern fidelity changing.
Language: English
Open Access status: bronze
OpenAlex ID: W4414429445
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