Work

A novel energy saving process for PFAS-free ArF immersion lithography

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3061716

Authors: Veerle Van Driessche, Douglas J. Guerrero, Daniel Sweat, Elke Caron, Seungjoo Baek

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4414429462

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