Work

Modeling of two-photon lithography including oxygen diffusion using a generalized compact model

Year: 2025

Type: conference-paper

Source: European Mask and Lithography Conference (EMLC)

DOI: 10.1117/12.3060161

Authors: Yuan Yu, Valeriia Sedova, Christian Schwemmer, Jonas Wiedenmann, Andreas Erdmann

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4414429465

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