Work

Numerical Investigation of Coupled Effects of Rotational Speed Difference and Growth Rate on VO x Defect Behavior in Czochralski Silicon

Year: 2025

Type: article

Source: Crystal Research and Technology

DOI: 10.1002/crat.70040

Authors: Qitao Zhang, Ai Wang, Tai Li, Peilin He, Yuwei Wang, Kaifeng Liao, Guoqiang Lv, Xingwei Yang, Wenhui Ma

Institutions: Kunming University of Science and Technology, Yunnan University

Language: English

Topic: Solidification and crystal growth phenomena

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Major Science and Technology Projects in Yunnan Province

Awards: G7049471115, G7876037186

OpenAlex ID: W4414443591

FWCI: 0.829

Cites: 26

Cited by: 4

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