Work

Research on the interface characteristics and leakage mechanisms of β -Ga2O3 MFIS capacitors using an HfO2–ZrO2 superlattice layer

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0287669

Authors: Dong-Liang Chen, Yun-Long He, Peng Liu, Xuan Huang, Shuo Zhang, Wei-Wei Chen, Lei Wang, Jun Yang, Guran Chen, Xiao-Li Lu, Lin-An Yang, Xue-Feng Zheng, Xiao-Hua Ma, Yue Hao

Institutions: Xidian University, Guangzhou Institute of Technology, China Academy of Space Technology

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G3352842052, G6167179484

OpenAlex ID: W4414471939

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Cites: 23

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