At-resolution stitching with high-reflectivity low-n masks
Year: 2025
Type: article
Authors: Nick Pellens, Vincent Wiaux, Natalia Davydova, Airat Galiullin, Lieve Van Look, Joost Bekaert, Jeremy Chen, Tatiana Kovalevich, Ataklti Weldeslassie, Frank Timmermans, Adam Lyons
Institutions: IMEC, ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4414487587